Cleanroom introduction


The next MNF cleanroom introductory course will be headed on Friday 18. May at 14.30 at CeNTech. Interested users who would like to use the cleanroom shall register until 11. May 2018 by sending an E-Mail to Simone Ferrari.

About the Münster Nanofabrication Facility - MNF


© Kresings, Münster

The Münster Nanofabrication Facility (MNF) is a Core science facility which is administrated by the Westfälische Wilhelms-Universität Münster (WWU).  The MNF operates in two cleanrooms which are located on the ground floor of the CeNTech building at Heisenbergstrasse 11 and in the new Center for Soft Nanoscience (SoN) at Busso-Peus-Straße 10.  The cleanroom facilities are currently run as an internal service provider to the WWU with a state-of-the-art machine park for advanced nanofabrication.

The initial cleanroom within the CeNTech was completed in 2003 and serves a diverse research community in nanophysics, nanobiology, nanochemistry and materials science.  Following WWU’s expanding presence in nanoscience, the original facility required significant upgrades to meet the needs of WWU researchers and to remain competitive with peer institutions.  Through the approval of the SoN research program, the WWU received a multimillion euro investment including capital equipment upgrade, as well as several large instrument grants. In 2017 the MNF will expand into brand new cleanroom facilities in the SoN building.

The MNF provides cleanroom laboratory space to an interdisciplinary research community of graduate students, postdocs and research associates in chemistry, physics and biology. Two full staff members and several technicians keep the facility running and take care of equipment repairs, facility maintenance and user training.


Nanoscribe introduction

Nanoscribe Intro

The Nanoscribe introduction was held for 3D laser lithography!
More info

EBPG-5150 now operative



The EBPG-5150 from Raith nanofabrication is running now and Electron-Beam Lithography patterns can now be written!
More info

Etching system running

MicroSys 200 etching system


The MicroSys 200 from Meyer Burger is running and can be used for etching with fluorine gases in the cleanroom from now on!
More info

New instrument arrived

Electron-Beam Lithography

Ebeam Arrival

The EBPG5150 from Raith nanofabrication has arrived for electron-beam lithography!

  • High KV for high aspect ration nanostructures
  • High Speed Direct Write
  • Minimum feature size less than 8 nm
More info

Cleanroom is running

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