UTAM (ultra-thin alumina mask) surface nano-patterning is an emerging technique in synthesizing ordered arrays of surface nanostructures (nano-dots, nanoholes, nanowires and nanotubes). It provides an efficient and well-controlled alternative in fabricating ordered arrays of surface nanostructures. Compared to other surface nanopatterning processes, the UTAM technique has advantageous features such as tuneable structural parameters and controllable properties, large pattern area and high throughput, low equipment costs, and general applicability in fabricating surface structures. The large-scale and well-defined surface nanostructures that are prepared using the UTAM technique are good candidate structures for the next generation of nano-devices.
Contact: Dr. M. Peterlechner, Prof. G. Wilde