Self-assembly and self-organization are widely believed to be central issues to utilize nanoscaled functional materials in real world fabrications and applications. Conceptually, self-assembly is used to form structures wherein the function allows little tolerance for defects and generally uses specific intermolecular interaction, while self-organization is used when there is more tolerance for defects and generally relies on a combination of non-specific interactions. Both can be used as bottom-up methods to create patterned surface structures instead of top-down approaches. Mechanisms for pattern formation and functionalities of patterned surface structures are important both for fundamental and applied perspectives.