Westfälische
Wilhelms-Universität Münster
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Institut für Materialphysik Wilhelm-Klemm-Str. 10 48149 Münster Geschäftsführender Direktor: Prof. Dr. Helmut Mehrer |
Tel. (0251) 83-33571
Fax: (0251) 83-38346 e-mail: mehrer@nwz.uni-muenster.de www: http://www.uni-muenster.de/Physik/MP/ |
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Forschungsschwerpunkte 2001 - 2002 Fachbereich 11 - Physik
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Source composition effects on dopant diffusion in gallium phosphide
Diffusion in III-V
semiconductors such as GaP often proceeds by using diffusion sources containing
substantial
amounts of Zn. However, such concentrated sources lead to Zn incorporation at high
concentration
levels which in turn is accompanied by the generation of microstructural defects such
as dislocations,
precipitates, and voids. To obtain information about the diffusion mechanism and the
participating
native point defects the formation of diffusion-induced microstructural defects must be
avoided.
Therefore we investigated diffusion of Zn into GaP for P-rich conditions between
803 °C and
1097 °C from extremely diluted Zn sources. Penetration profiles measured by
secondary ion
mass spectroscopy and electrochemical capacitance-voltage profiling are in mutual
accordance. The
profiles are well described within the framework of interstitial-substitutional diffusion
yielding not only
Zn diffusion coefficients but also transport coefficients for the Ga-related native point
defects
involved. The latter data are compared with self-diffusion data related to the Ga
sublattice in GaP.
Here we find discrepancies which require an alternative interpretation. In this context
we theoretically
explore the possibility that mobile counter-defects, i.e., those belonging to the
sublattice opposite to
the residence of the diffusing dopant (Zn), play a crucial role in the diffusion process.
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